For substrates up to 200mm round or 6″ x 6″ square
For substrates up to 450mm round or 14″ x 14″ square
Beginning February 2024, all standard Cee® Apogee® Spin Coaters will bear the Intertek ETL NRTL mark, certifying adherence with North American safety standards.
Don’t risk your lithography results with outdated bath immersions and stopwatches. Get unmatched precision, consistent chemistry, flawless pattern development, and a clean dry wafer—every time with the Apogee® Spin Developer.
Whether it’s photomasks or wafers, cleaning, developing, or metal lift-off, you’re covered. With direct spray, stream dispense, or optional high-impingement spray, you can count on consistent results.
Unlock what manual processes can’t achieve, and realize your new standard of excellence. Step-by-step programmability and adjustable dispense configurations provide unmatched repeatability, enhance aspect ratios, and reduce waste.
A solution built to last. Whether in cutting-edge R&D labs or high-demand production environments, Cee® Spin Developers are engineered with top-quality materials and subjected to rigorous durability testing. For almost 40 years, professionals around the globe have trusted Cee® systems to provide dependable, long-lasting performance they can count on.
Engineered for superior performance, usability, versatility—and peace of mind.
On-board 7-inch color touchscreen with DataStream™ OS included for visibility and your ease-of-use.
Removes residual from the substrate’s underside by evenly distributing a rinse solution during spinning.
A splash ring prevents materials from splashing back onto the wafer, ensuring a contamination-free surface and defect-free results.
A brushless motor and indirect drive with oversized bearings/belt provide unmatched uptime, thermal isolation, and performance.
The built-in spindle fluid deflector keeps liquids out of your drive train and bearings, without purge gases.
Integrated PFA fluid trap protects your vacuum components and pumps from unwanted contamination and blockage.
Sophisticated fluid separator evacuates chemical fumes while safely guiding fluid waste to the drain.
A wide range of controls and sensors allows you to achieve the most precise and consistent results. Our intuitive interface gives you complete control over every parameter. Experience the freedom to experiment and optimize, knowing our technology will help you achieve excellence with every use.
“This system has completely transformed how we approach our production. The customizable settings allow us to fine-tune every detail. It’s like having a tailored solution for every unique requirement.” – Customer Testimonial
Achieve consistent results, time and time again. Apogee® Spin Developers deliver steady, high-quality performance you can count on. Constructed with robust materials and supported by a team of experts, our systems are your dependable ally.
NRTL certification is crucial for semiconductor equipment, ensuring compliance with safety standards set by regulatory bodies like OSHA and ANSI.
Cee® spin coaters are NRTL listed right out of the box…
…your safety department is going to love you.
Knowledge is power. With DataStream™ technology, monitor and manage in real time, ensuring production-quality results from anywhere. Proactive warnings and detailed log files give you the information you need to succeed.
Process parameters and measurements are logged in real-time. Export in multiple formats for analysis, troubleshooting, and process optimization.
Access your Apogee® Spin Coater remotely via any web browser for real-time monitoring, adjustments, and recipe management. Create, modify, upload, download, and archive recipes seamlessly.
When advanced processes require advanced features, Cee® has you covered. Personalize your spin coater right from the factory.
Discover a whole new level of control with AccuScan™ Dispense; a programmable scanning arm offering precision dispense and edge bead removal.
Control is confidence. Eliminate exhaust fluctuations and adjust for varying process needs. Safeguard your process with the Optiflow™ Exhaust Management System.
Challenge accepted! Any size, shape, material, or design, Cee® tailored spin chucks are expertly matched to your substrates.
With four decades of experience, our experts will collaborate closely with you to understand your requirements and deliver solutions that exceed expectations.
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