Single substrate spray developing is used when tank immersion or batch processes aren’t good enough.  By controlling the liquid materials dispense in coordination with wafer rotation and unlimited recipe steps, stable, repeatable pattern development is achieved.

All Cee® Spin developers can be configured for fan style top-spray or side-spray, and puddle dispense using multiple materials such as pre-wets, developer, rinse agents, solvents and nitrogen blow-off to enhance drying.  These tools are routinely used for the exacting needs of leading edge photolithography, e-beam lithography, thick film MEMS and bio-medical processing as well as photomasks and other exotic substrates.

Optional programmable exhaust management offers another layer of recipe control over critical processes.

When consistency and yield matter, Cee® Spin Developers have the performance and control you need.